貴金屬銥濺射靶材(Ir)Iridium Target

高純貴金屬磁控濺射鍍膜銥靶材(Ir) Iridium銥靶 銥板 銥片材料

產(chǎn)品詳情

隨著靶材在磁記錄介質(zhì)、電子半導(dǎo)體、薄膜太陽能及平面顯示等產(chǎn)業(yè)的發(fā)展，我們加大在稀貴金屬靶材研發(fā)和制備方面的投入力度，通過原料控制、真空感應(yīng)熔煉、擠壓、軋制、真空熱壓燒結(jié)、熱等靜壓、放電等離子體燒結(jié)等不同工藝, 并采用嚴(yán)格的質(zhì)量控制過程，我們能夠制備多種靶材并能一直保持著批量供貨。

公司在上海，江蘇蘇州，南京，北京，廣東深圳，廣州等地設(shè)有工廠及銷售中心開展貴金屬靶材業(yè)務(wù)，綁定服務(wù)，貴金屬回收。

銥濺射靶材Iridium (Ir)

   規(guī)格尺寸：

注：具體尺寸請(qǐng)聯(lián)系銷售。

Iridium (Ir)Sputtering Targets

ChemicalFormula: Ir
CAS Number: 7439-88-5
Purity: 99.95%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Atomic Weight: 192.217
Atomic Number: 77
Color/Appearance: Silvery White, Metallic
Thermal Conductivity: 150 W/m.K
Melting Point (°C): 2,410
Coefficient of Thermal Expansion: 6.4 x 10-6/K
Theoretical Density (g/cc): 22.42
Z Ratio: 0.129
Sputter: DC
Max Power Density* (Watts/Square Inch): 100
Type of Bond: Indium, Elastomer

Iridium

Iridiumis a chemical element originated from Iris, the Greek goddess of the rainbow.It was first mentioned in 1803 and observed by S. Tennant. The isolation waslater accomplished and announced by S. Tennant. “Ir” is the canonical chemicalsymbol of iridium. Its atomic number in the periodic table of elements is 77with location at Period 6 and Group 9, belonging to the d-block. The relativeatomic mass of iridium is 192.217(3) Dalton, the number in the bracketsindicating the uncertainty